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Chemically etched to light a defined micro electrical contacts

机译:化学蚀刻以点亮定义的微电触点

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a probe whose uniformity is improved while the production cost of the probe is being reduced.;SOLUTION: The method of working a plurality of microprobes (81) comprises a step in which shapes (72) of the plurality of microprobes (81) are used as masks (73) so as to be demarcated; a step in which the surface of a metal foil (1201) is coated with a photoresist (1001); a step in which the masks (73) are placed on the metal foil (1201); a step in which the photoresist (1001) is exposed to light passed through the masks (73); a step in which the photoresist (1001) is developed; a step in which a part of the photoresist (1001) is removed and, in which a part of the metal foil (1201) is exposed; a step in which the surface of the metal foil (1201) is coated with an etchant, in which the exposed part is removed, and in which the plurality of microprobes (81) are created; and a step in which the plurality of microprobes (81) are chemically polished and plated.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种制造探针的方法,该探针的均匀性得到改善,同时降低了探针的生产成本。解决方案:处理多个微探针(81)的方法包括形成形状(72)的步骤多个微探针(81)中的)被用作掩模(73),以被划界。在金属箔(1201)的表面上涂布光致抗蚀剂(1001)的工序。将掩模(73)放置在金属箔(1201)上的步骤;将光致抗蚀剂(1001)暴露于穿过掩模(73)的光的步骤;显影光致抗蚀剂(1001)的步骤;步骤:去除光致抗蚀剂(1001)的一部分,并且使金属箔(1201)的一部分暴露。步骤:在金属箔(1201)的表面上涂覆蚀刻剂,去除暴露部分,并形成多个微探针(81)。 ;以及对多个微探针(81)进行化学抛光和电镀的步骤。;版权所有:(C)2003,JPO

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