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Static electricity the plasma central processing unit and the static electricity which have the breaking off feature of the suffering treatment substrate which is adsorbed in the chamber where the suffering treatment substrate is put
Static electricity the plasma central processing unit and the static electricity which have the breaking off feature of the suffering treatment substrate which is adsorbed in the chamber where the suffering treatment substrate is put
PURPOSE:To provide a plasma processing apparatus including a mechanism capable of rapidly, securely and safely removing a substrate to be processed from an electrostatic attraction electrode, and provide a removal method of the substrate. CONSTITUTION:In a plasma processing apparatus including an electrostatic attraction clamp, there are provided on a vacuum tank 10 a lift pin 9 protrudable from an electrostatic attraction electrode surface and one or a plurality of mixed gas introduction mechanisms 1 for gas containing at least one kind among air diluted gas, inorganic gas, or atoms of nitrogen, oxygen, sulfur, chlorine or fluorine. There are further provided pressure control systems 7, 7a, 7b for keeping the pressure of the mixture gas at a predetermined pressure. Upon removing the susbtrate 5, removal force is exerted by the lift pin 9 and the pressure of the mixture gas is kept at a predetermined pressure (0.1 to 500 Pa).
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