首页> 外国专利> Static electricity the plasma central processing unit and the static electricity which have the breaking off feature of the suffering treatment substrate which is adsorbed in the chamber where the suffering treatment substrate is put

Static electricity the plasma central processing unit and the static electricity which have the breaking off feature of the suffering treatment substrate which is adsorbed in the chamber where the suffering treatment substrate is put

机译:具有等离子体处理的静电的等离子体中央处理单元和静电具有吸附在放置有治疗基板的腔室中的受治疗基板的折断特征。

摘要

PURPOSE:To provide a plasma processing apparatus including a mechanism capable of rapidly, securely and safely removing a substrate to be processed from an electrostatic attraction electrode, and provide a removal method of the substrate. CONSTITUTION:In a plasma processing apparatus including an electrostatic attraction clamp, there are provided on a vacuum tank 10 a lift pin 9 protrudable from an electrostatic attraction electrode surface and one or a plurality of mixed gas introduction mechanisms 1 for gas containing at least one kind among air diluted gas, inorganic gas, or atoms of nitrogen, oxygen, sulfur, chlorine or fluorine. There are further provided pressure control systems 7, 7a, 7b for keeping the pressure of the mixture gas at a predetermined pressure. Upon removing the susbtrate 5, removal force is exerted by the lift pin 9 and the pressure of the mixture gas is kept at a predetermined pressure (0.1 to 500 Pa).
机译:目的:提供一种等离子体处理设备,其包括能够快速,安全且安全地从静电吸引电极去除待处理的基板的机构,并提供一种基板的去除方法。组成:在具有静电吸引夹具的等离子处理设备中,真空罐10上设有可从静电吸引电极表面伸出的升降销9和一个或多个混合气体引入机构1,用于至少含一种气体空气稀释气体,无机气体或氮,氧,硫,氯或氟原子中的一种。还提供了压力控制系统7、7a,7b,用于将混合气体的压力保持在预定压力。在除去表面残留物5时,通过升降销9施加去除力,并且将混合气体的压力保持在预定压力(0.1至500Pa)。

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