STAGE SYSTEM, STATIC-PRESSURE BEARING DEVICE, METHOD FOR POSITIONING, EXPOSURE SYSTEM, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To inexpensively obtain a highly accurate nonmagnetic stage system that can be used in a high vacuum suitably to an electron beam exposure system.;SOLUTION: The deflection of an electron beam caused by eddy currents generated by leakage magnetic fields from the electronic oven of the electron beam exposure system and the deflection of the beam caused by the influence of charge up by secondary electrons are reduced sufficiently by constituting a mobile guide 3 journaled by the static-pressure bearing 10 of a conductive material having a volume resistance of about 1E^-3Ωcm or higher.;COPYRIGHT: (C)2005,JPO&NCIPI