Cleaning water generation method and cleaning method, and cleaning water generation device and cleaning device

摘要

PROBLEM TO BE SOLVED: To solve a problem that, in wet cleaning of electronic components such as liquid crystal substrates and Ics, the substrate is damaged when it is wasthed with an acidic or alkaline solution or that the deposit on the surface of the substrate can hardly be removed when it is washed with weakly detergent ultrapure water. ;SOLUTION: Ozone water is mixed with an acidic solution or an alkaline solution to form acidic cleaning water 1 having an oxidizing power or an alkaline cleaning water having an oxidizing power. Hydrogen water is mixed with an acidic solution or an alkaline solution to form an alkaline cleaning water 2 having a reducing power or an acidic cleaning water 4 having a reducing power. These cleaning waters have a high detergency and are capable of the adjustment of ORP or pH. Therefore, a suitable type of cleaning water can be selected according to the type of the deposit in a production process of substrates, and one type of cleaning water can deterge a plurality of types of deposits.;COPYRIGHT: (C)1997,JPO