Method of manufacturing equipment focus monitoring photo-mask, focus monitoring method, and focus monitoring equipment

摘要

PROBLEM TO BE SOLVED: To provide a photomask, method and device for focus monitoring, and a manufacturing method for the device which make it easy to form the photomask, eliminate the need to replace an illumination aperture, and have high z-axial detection sensitivity.;SOLUTION: The photomask 5 for focus monitoring has a substrate 5a that transmits exposure light and a unit mask structure Q for focus monitoring. The unit mask structure Q for focus monitoring has two patterns 5b₁ and 5b₂ for position measurement which are formed on the surface of the substrate 5a and a shading film 5c having a reverse-surface pattern 5d which is formed on the reverse surface of the substrate 5a and makes substantially different the directions of incidence of the exposure light on the two patterns 5b₁ and 5b₂ for position measurement. Here, L/λ is ≥10, where L is the size of the reverse-surface pattern 5d and λ is the wavelength of the exposure light.;COPYRIGHT: (C)2003,JPO