To possess the applied device null evacuation opening and material gas introduction means of selection

摘要

PROBLEM TO BE SOLVED: To provide a film deposition method and a film deposition system by which a deposition film having a higher polymerization degree and higher purity can easily be obtained. ;SOLUTION: An organic gas or an organometallic gas is introduced into the space between the anode and the cathode. Glow discharge is generated by direct current voltage applid to the space between the anode and the cathode, and a film is deposited on the surface of a test sample by organic molecular ions or metallic atom ions converted into cations in a negative glow phase region. In this system, the cathode is provided with an opening, and the film is deposited on the surface of the test sample by the organic molecular ions or metallic atom ions accelerated in the negative glow region to pass through the opening.;COPYRIGHT: (C)2003,JPO