首页> 外国专利> Stereolithographic methods for fabricating hermetic semiconductor device packages and semiconductor devices including stereolithographically fabricated hermetic packages

Stereolithographic methods for fabricating hermetic semiconductor device packages and semiconductor devices including stereolithographically fabricated hermetic packages

机译:用于制造密封半导体器件封装的立体光刻方法以及包括立体光刻制造的密封封装的半导体器件

摘要

A stereolithographically fabricated, substantially hermetic package surrounds at least a portion of a semiconductor die so as to substantially hermetically seal the same. Stereolithographic processes may be used to fabricate at least a portion of the substantially hermetic package from thermoplastic glass, other types of glass, ceramics, or metals. The substantially hermetic package may be used with semiconductor device assemblies or with bare or minimally packaged semiconductor dice, including dice that have yet to be singulated from a wafer. The stereolithographic method may include use of a machine vision system including at least one camera operably associated with a computer controlling a stereolithographic application of material so that the system may recognize the position, orientation, and features of a semiconductor device assembly, semiconductor die, or other substrate on which the substantially hermetic package is to be fabricated.
机译:立体光刻制造的,基本上气密的封装围绕半导体管芯的至少一部分,从而基本上将其密封。立体光刻工艺可以用于由热塑性玻璃,其他类型的玻璃,陶瓷或金属来制造至少一部分基本气密的包装。基本上气密的封装可以与半导体器件组件一起使用,或者与裸露的或最小封装的半导体管芯一起使用,包括尚未从晶片分离的管芯。立体光刻方法可包括使用机器视觉系统,该机器视觉系统包括至少一个与可操作地与控制材料的立体光刻应用程序的计算机相关联的照相机,以便该系统可以识别半导体器件组件,半导体管芯或半导体器件的位置,方向和特征。在其上将制造基本气密包装的另一基板。

著录项

  • 公开/公告号US2005009245A1

    专利类型

  • 公开/公告日2005-01-13

    原文格式PDF

  • 申请/专利权人 WARREN M. FARNWORTH;

    申请/专利号US20040912469

  • 发明设计人 WARREN M. FARNWORTH;

    申请日2004-08-03

  • 分类号H01L21/44;H01L21/48;H01L21/50;H01L23/29;

  • 国家 US

  • 入库时间 2022-08-21 22:25:36

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