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Formaldehyde-free electroless copper plating process and solution for use in the process

机译:无甲醛化学镀铜工艺及该工艺中使用的溶液

摘要

This invention provides a process for electroless copper plating without using formaldehyde and an electroless copper plating solution which is used in the process. To this end, there is disclosed a process for electroless copper plating, which treatment comprises depositing a palladium or palladium-tin catalyst on a resin substrate, and then treating said resin substrate having the catalyst deposited thereon with a formaldehyde-free electroless copper plating solution that contains copper ions and a reducing agent, wherein the need for an accelerating treatment of a catalyst after said catalyst depositing treatment is obviated. The productivity of a copper-resin composite material is dramatically enhanced by the process of the present invention, because a copper thin layer can be formed on the resin substrate in a short time, even if an accelerating treatment for a catalyst is not performed in a separate process.
机译:本发明提供一种不使用甲醛的化学镀铜的方法和该方法中使用的化学镀铜溶液。为此,公开了一种化学镀铜的方法,该处理包括在树脂基板上沉积钯或钯-锡催化剂,然后用无甲醛的化学镀铜溶液处理其上沉积有催化剂的所述树脂基板。该催化剂含有铜离子和还原剂,其中消除了在所述催化剂沉积处理之后对催化剂进行加速处理的需要。通过本发明的方法极大地提高了铜-树脂复合材料的生产率,因为即使在不进行催化剂的加速处理的情况下,也可以在短时间内在树脂基板上形成铜薄层。分开的过程。

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