Technique of suppressing influence of contamination of exposure atmosphere

摘要

An exposure apparatus includes a projection optical system which has a plurality of optical elements, and directs light from an original to an object to be exposed; a first stage which holds the object to be exposed; a first vacuum chamber which contains the first stage; and a second vacuum chamber which is adjacent to the first vacuum chamber, contains a part of the plurality of optical elements, and communicates with the first vacuum chamber through a first opening. The pressure in the second vacuum chamber is higher than pressure in the first vacuum chamber.