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Optoelectronic component for converting electromagnetic radiation into an intensity-dependent photocurrent

机译:用于将电磁辐射转换为强度相关的光电流的光电组件

摘要

Optoelectronic component for converting electromagnetic radiation into an intensity-dependent photocurrent comprising a substrate formed in CMOS technology, in particular, with an integrated semiconductor structure (ASIC) and an optically active thin-film structure arranged upstream in the direction of light incidence and comprising in each case at least one layer made of doped and at least one layer made of undoped semiconductor material, which is connected to a microelectronic circuit arranged on the substrate by means of an insulating layer, within which are situated connecting means for contact-connecting the optically active thin-film structure to the semiconductor structure. The invention is based on the object of providing an optoelectronic component, and a method for fabricating it, which, on the one hand, can be fabricated more simply and, on the other hand, has a reduced dark current. This object is achieved according to the invention by virtue of the fact that the optically active thin-film structure has a layer sequence made of a metal and an intrinsically conducting amorphous or microcrystalline semiconductor material, in particular silicon and alloys thereof, which is applied directly to the planarized insulating layer.
机译:用于将电磁辐射转换为与强度有关的光电流的光电组件,该组件包括以CMOS技术形成的基板,尤其是具有集成半导体结构(ASIC)和光学有源薄膜结构的光学组件,该结构沿光入射方向位于上游,并且在每种情况下,至少一层由掺杂的材料制成的层和至少一层由未掺杂的半导体材料制成的层,其通过绝缘层连接到布置在基板上的微电子电路,在该微电子电路中设有用于光学接触连接的连接装置。有源薄膜结构转变为半导体结构。发明内容本发明的目的是提供一种光电子器件及其制造方法,该光电子器件一方面可以更简单地制造并且另一方面具有减小的暗电流。根据本发明,该目的通过以下方式实现:光学活性薄膜结构具有由金属和直接导电的非晶态或微晶半导体材料,特别是硅及其合金制成的层序列,到平坦化的绝缘层。

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