Thermal physical vapor deposition source with minimized internal condensation effects

摘要

A thermal physical vapor deposition source for depositing material onto a substrate includes an elongated container for receiving the material, the container having a conductance C_B in the elongated direction, and a heater for heating the material in the container to vaporize the material to a partial pressure P_m. The container has at least one member defining a plurality of apertures arranged along the length of the member, the apertures having a total conductance C_A, wherein $$ \frac{C_A}{C_B}\le 0.5;$$and end heaters for heating each side of the container to reduce condensation of material onto the container.