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Method for forming a photonic band-gap structure and a device fabricated in accordance with such a method
Method for forming a photonic band-gap structure and a device fabricated in accordance with such a method
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机译:形成光子带隙结构的方法和根据该方法制造的器件
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摘要
A device for application in the high frequency field and a method for forming a photonic band-gap structure are provided. The device being mountable on a primary substrate for forming the device. The device being formed by forming conformal coplanar waveguide metallizations on surface areas of two substrates, connecting the conformal coplanar waveguide metallizations of the two substrates, and structured back-etching of the two substrates, starting at surface areas of the two substrates that are opposite the coplanar waveguide metallizations.
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