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Ring chuck to hold 200 and 300 mm wafer

机译:环形卡盘可容纳200和300毫米晶圆

摘要

A ring chuck that holds a wafer with a vacuum uses a vacuum trough that contacts the entire outer edge of the wafer. The chuck has a base having a top surface equal to or slightly smaller than a water to be tested with vacuum channels in the base. The base provides the mechanism to connect the chuck to a measurement instrument and a vacuum source. An annulus of non-contaminant material that has concentric rings extending upward from its outer edge is fixed to the base top surface with the trough between the concentric rings connected to the vacuum channels. The vacuum trough holds the wafer securely to the chuck and minimizes vibrations when the wafer is rotated.
机译:用真空保持晶片的环形卡盘使用与晶片的整个外边缘接触的真空槽。该卡盘具有一个基座,该基座的顶表面等于或略小于要通过基座中的真空通道进行测试的水。底座提供了将卡盘连接到测量仪器和真空源的机制。具有从其外边缘向上延伸的同心环的无污染材料的环被固定到基部顶表面,同心环之间的槽连接到真空通道。真空槽将晶片牢固地固定在卡盘上,并在旋转晶片时使振动最小化。

著录项

  • 公开/公告号US6954269B2

    专利类型

  • 公开/公告日2005-10-11

    原文格式PDF

  • 申请/专利权人 CHRISTOPHER GAAL;JAYDEEP SINHA;

    申请/专利号US20030348099

  • 发明设计人 CHRISTOPHER GAAL;JAYDEEP SINHA;

    申请日2003-01-21

  • 分类号G01N21/01;

  • 国家 US

  • 入库时间 2022-08-21 22:21:05

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