State-of-the-art Technologies and Kinematical Analysis for One-Stop Finishing of φ300 mm Si Wafer

摘要

This research has successfully developed an advance d manufacturing system for 300mm silicon wafer,using fixed abrasive instead o f conventional free slurry,to provide a totally integrated solution for achievi ng the surface roughness Ra<1 nm(Ry<5～6 nm) and the global flatness