Low-mass and compact stage devices exhibiting six degrees of freedom of fine motion, and microlithography systems comprising same

摘要

Low-mass and compact stage devices are disclosed that exhibit, compared to conventional stage devices, reduced magnetic field fluctuations. An embodiment of such a stage device includes an X-Y coarse-movement stage portion that is drivable in the X-Y directions using respective air cylinders. A fine-movement stage portion is mounted on the X-Y coarse-movement stage portion. The fine-movement stage portion is drivable in any of the six degrees of freedom of motion (i.e., X, Y, Z, θ_X, θ_Y, and θ_Z motions) relative to the coarse-movement stage portion. Such fine movements are achieved using six piezo actuators. In a stage device configured for use in a microlithography apparatus, a wafer table or reticle table can be mounted on the fine-movement table.