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Mass production of cross-section TEM samples by focused ion beam deposition and anisotropic etching
Mass production of cross-section TEM samples by focused ion beam deposition and anisotropic etching
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机译:通过聚焦离子束沉积和各向异性蚀刻大量生产横截面TEM样品
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摘要
A method of preparing a TEM sample. A focused ion beam is used to deposit a mask on the material to be sampled. Reactive ion etching removes material not protected by the mask, leaving a wall thin enough to be imaged by TEM.
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