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High voltage and low on-resistance LDMOS transistor having equalized capacitance

机译:具有相等电容的高电压和低导通电阻LDMOS晶体管

摘要

A high voltage LDMOS transistor according to the present invention includes P-field blocks in the extended drain region of a N-well. The P-field blocks form the junction-fields in the N-well for equalizing the capacitance of parasitic capacitors between the drain region and the source region and fully deplete the drift region before breakdown occurs. A higher breakdown voltage is therefore achieved and the N-well having a higher doping density is thus allowed. The higher doping density reduces the on-resistance of the transistor. Furthermore, the portion of the N-well generated beneath the source diffusion region produces a low-impedance path for the source region, which restricts the transistor current flow in between the drain region and the source region.
机译:根据本发明的高压LDMOS晶体管包括在N阱的扩展漏极区域中的P场块。 P场块形成N阱中的结场,以使漏极区和源极区之间的寄生电容器的电容相等,并在发生击穿之前完全耗尽漂移区。因此,实现了更高的击穿电压,并且因此允许具有更高的掺杂密度的N阱。较高的掺杂密度降低了晶体管的导通电阻。此外,在源极扩散区下方产生的N阱部分为源极区产生了低阻抗路径,这限制了晶体管电流在漏极区和源极区之间流动。

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