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Polymer material having a low glass transition temperature for use in chemically amplified photoresists for semiconductor production
Polymer material having a low glass transition temperature for use in chemically amplified photoresists for semiconductor production
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机译:玻璃化转变温度低的聚合物材料,用于半导体生产中的化学放大光致抗蚀剂
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摘要
The invention relates to a polymer obtained by copolymerization of a first comonomer having a group catalytically cleavable by acid, a second comonomer having an anchor group for the subsequent linkage of an amplification agent, and a third comonomer having a carboxyl group being esterified with an alkyl group. It is also possible for one or more carbon atoms in the alkyl group to be replaced by oxygen. The polymer may also include fourth comonomers that include silicon-containing groups. By using the alkyl or alkoxyalkyleneoxy side groups introduced with the third comonomer, the glass transition temperature of the polymer can be reduced so that a photoresist containing the polymer provides a homogeneous polymer film on heating.
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