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METHOD FOR FABRICATING AN ELECTRICALLY ADDRESSABLE SILICON-ON-SAPPHIRE LIGHT VALVE

机译:制造可电寻址的硅上硅光阀的方法

摘要

A method for fabricating a monolithically integrated liquid crystal arraydisplay and control circuitry on a silicon-on-sapphire structurecomprises the steps of: a) forming an epitaxial silicon layer (40) on asapphire substrate (30) to create a silicon-on-sapphire structure; b)ion implanting the epitaxial silicon layer; c) annealing the silicon-on-sapphire structure; d) oxidizing the epitaxial silicon layer to form asilicon dioxide layer from portion of the epitaxial silicon layer so that athinned epitaxial silicon layer remains; e) removing the silicondioxide layer to expose the thinned epitaxial silicon layer, f) fabricating anarray of pixels (122) from the thinned epitaxial silicon layer;and g) fabricating integrated circuit (124, 126) from the thinned epitaxialsilicon layer which is operably coupled to modulate the pixels.The thinned epitaxial silicon layer supports the fabrication of device qualitycircuitry which is used to control the operation of the pixels.
机译:一种单片集成液晶阵列的制造方法蓝宝石硅结构上的显示和控制电路包括以下步骤:a)在a上形成外延硅层(40)。蓝宝石衬底(30)以产生蓝宝石上的硅结构; b)离子注入外延硅层; c)对硅进行退火蓝宝石结构; d)氧化外延硅层以形成二氧化硅层从外延硅层的一部分保留薄的外延硅层; e)去除硅二氧化硅层以暴露出变薄的外延硅层,f)来自减薄的外延硅层的像素阵列(122);g)由减薄的外延制造集成电路(124,126)可操作地耦合以调制像素的硅层。减薄的外延硅层可支持器件质量的制造用于控制像素操作的电路。

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