WAFER INSPECTION USING A NONVIBRATING CONTACT POTENTIAL DIFFERENCE PROBE (NONVIBRATING KELVIN PROBE)

摘要

A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference (NVCPD) sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.