PRODUCTION METHOD FOR THIN FILM AND PRODUCTION METHOD FOR THIN FILM WIRE AND PULSE LASER VAPOR DEPOSITION DEVICE

摘要

A production method for a thin film capable of forming a thin film on a large-area substrate or a wide wire by disposing a thin-film-forming substrate within ±45 deg. range of Y-axis as viewed from a Z direction when, with a laser beam condensed in a line form onto a target, the origin is set at the center of the line-form laser beam in an irradiation position on the target, a Z-axis in a longer-side direction, an X-axis in a shorter-side direction, and a Y-axis in a normal direction to the target surface, in a pulse laser vapor deposition method of forming a thin film on a substrate by irradiating the target with a laser beam and depositing a plasma-base target material on the substrate.