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Uncoupled wafer inclination measurement with an ellipsometer with spectral photometer and measurement of focus by a reflecting objective
Uncoupled wafer inclination measurement with an ellipsometer with spectral photometer and measurement of focus by a reflecting objective
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机译:使用具有光谱光度计的椭圆仪进行不耦合的晶圆倾角测量,并通过反射物镜测量焦点
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摘要
A positioning system (47,47a) receives positioning commands of an evaluation circuit (46). A specimen stage (12) tilts until the position of the return reflection of the direction monitoring beam on position-sensitive area detector (39) corresponds to a given position at which the direction of the line normal to the specimen surface corresponds to the direction of the angle bisector. An Independent claim is included for: (a) a method for measuring the inclination between a line perpendicular to a measurement location on a specimen and an optical axis defined by an objective.
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