PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY

摘要

The present invention provides a kind of novel fluorinated copolymers, it includes at least one fluoroolefins, and at least one is interconnected to form quaternary carbocyclic ring, and optional other components with fused polycycle ethylenically unsaturated monomers. Polymer can be used as optical imaging composition, and especially photo-corrosion-resisting agent composition (positive-working and/or negative-working) is as the production of semiconductor devices. The polymer is used especially for photo-corrosion-resisting agent composition with high UV transparencies (especially in shortwave strong point, such as 157 nanometers), these can be used as base resin in resist and may be in many other applications.