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HIGH-DENSITY PLASMA OXIDE LAYER DEPOSITION APPARATUS HAVING TWO OR MORE SEPARABLE CHUCKS FOR EXCLUDING INFLUENCE OF ELECTRIC POTENTIAL AND FORMING UNIFORMLY DENSITY DISTRIBUTION OF PLASMA IONS
HIGH-DENSITY PLASMA OXIDE LAYER DEPOSITION APPARATUS HAVING TWO OR MORE SEPARABLE CHUCKS FOR EXCLUDING INFLUENCE OF ELECTRIC POTENTIAL AND FORMING UNIFORMLY DENSITY DISTRIBUTION OF PLASMA IONS
Purpose: a high density plasma oxide layer precipitation equipment, it is in addition to an influence of electric potential and to be formed uniformly the Density Distributions of plasma ions with two or more separable collets, it is arranged to exclude processing defect due to gap by forming an oxide layer, there is the uniform thickness in semi-conductive substrate and prevent from generating gap within a bar ditch in the method for being used to form an oxide layer. Construction: a high density plasma oxide layer precipitation equipment includes collet (160,170), and a thermal insulation material (150) is used to protect collet, and is connected to a lower electrode (180,190) for collet. Collet is divided into two more collets. Lower electrode is connected to the collet of each division. The collet of each division is divided into thermal insulation material. Same power is applied to the collet of each division.
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