APPLICATION METHOD OF WATER-SOLUBLE NEGATIVE TONE PHOTORESIST TO PROVIDE SUFFICIENT PROCESS MARGIN AND OPTIMAL USE OF MATERIAL COATED WITH PHOTORESIST WITH RESPECT TO PACKING AND UNPACKING METHOD IN PHOTORESIST EXPOSURE

摘要

PURPOSE: An application method of water-soluble negative tone photoresist is provided to give sufficient process margin and the optimal use of a material coated with the photoresist with respect to the packing and unpacking(PAU) method in photoresist exposure, thereby being possible to form contact holes with a narrow interval. CONSTITUTION: The application method of water-soluble negative tone photoresist for generating contact holes at a narrow interval comprises the steps of: preparing a substrate(20) having a first photoresist layer(22) to form patterns of contact holes; exposing the surface of the first photoresist layer with a first mask comprising a first and a second patterns of the contact holes; forming openings(23) on the first photoresist layer according to the first and the second patterns of the contact holes; attaching a second negative tone photoresist layer onto the surface of the first photoresist layer; and forming openings(24) on the second negative tone photoresist layer according to the second pattern of the contact holes.