首页> 外国专利> COSMETIC COMPOSITION FOR COVERING DEFECTS OF SKIN, IN PARTICULAR, SKIN WRINKLES AND ACNE SCARS AND MANUFACTURING METHOD THEREOF

COSMETIC COMPOSITION FOR COVERING DEFECTS OF SKIN, IN PARTICULAR, SKIN WRINKLES AND ACNE SCARS AND MANUFACTURING METHOD THEREOF

机译:覆盖皮肤,尤其是皮肤皱纹和痤疮疤痕的化妆品成分及其制造方法

摘要

PURPOSE: Provided are a cosmetic composition for covering defects of skin, in particular, skin wrinkles and acne scars without adverse side effects and a manufacturing method thereof. CONSTITUTION: The cosmetic composition for covering defects of skin, in particular, skin wrinkles and acne scars is characterized by containing 18-25 parts by weight of butylene glycol dicaprylate/dicaprate and 36-75 parts by weight of silicon and silanes including cyclomethicone, silica, dimethicone, cyclopentasiloxane and polysilicone. It further contains 0.01-10 parts by weight of at least one of antioxidant, sun-blocking agent and fragrance.
机译:用途:提供了一种化妆品组合物及其制造方法,所述化妆品组合物用于覆盖皮肤的缺陷,特别是皮肤皱纹和痤疮疤痕而没有不利的副作用。组成:用于覆盖皮肤缺陷,特别是皮肤皱纹和痤疮疤痕的化妆品组合物,其特征在于含有18-25重量份的丁二醇二辛酸酯/二癸酸酯和36-75重量份的硅和硅烷,包括环甲硅油,二氧化硅,二甲硅油,环戊硅氧烷和聚硅氧烷。它进一步包含0.01-10重量份的抗氧化剂,防晒剂和香料中的至少一种。

著录项

  • 公开/公告号KR20040108284A

    专利类型

  • 公开/公告日2004-12-23

    原文格式PDF

  • 申请/专利权人 SEA YOUNG SHEIK;

    申请/专利号KR20030039206

  • 发明设计人 SEA YOUNG SHEIK;

    申请日2003-06-17

  • 分类号A61K7/02;

  • 国家 KR

  • 入库时间 2022-08-21 22:06:23

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