首页> 外国专利> LIQUID TANK CAPABLE OF MAINTAINING UNIFORMITY IN TEMPERATURE AND DENSITY OF LIQUID FOR WET PLATING

LIQUID TANK CAPABLE OF MAINTAINING UNIFORMITY IN TEMPERATURE AND DENSITY OF LIQUID FOR WET PLATING

机译:能够保持温度均匀性的湿罐的液体罐

摘要

PURPOSE: A liquid tank is provided to maintain an uniform distribution of temperature and density of liquid for a wet plating and to create an excellent quality of gold-plating product which has no line patterns on the plating surface by restricting a rotating flow generated from the agitation of plating liquid. CONSTITUTION: A process liquid is discharged from an agitating service electrolytic cell, and is introduced into an agitating chamber(16). The process liquid is agitated by an agitating means in the agitating chamber. The process liquid proceeds from the agitating chamber to the process electrolytic cell through a liquid supplying tunnel. A liquid supplying outlet(14) is located at one end portion of the liquid supplying tunnel. The liquid supplying outlet is opened from the bottom portion of the process electrolytic cell to the process electrolytic cell.
机译:用途:提供一个储液罐,以保持湿镀的温度和液体密度的均匀分布,并通过限制由镀液产生的旋转流,在镀层表面形成无线条图案的优质镀金产品。搅动电镀液。组成:处理液从搅拌服务电解池中排出,并引入搅拌室(16)。通过搅拌室内的搅拌装置搅拌处理液。处理液通过液体供应通道从搅拌室进入处理电解池。液体供应出口(14)位于液体供应通道的一端。液体供应出口从过程电解池的底部向过程电解池敞开。

著录项

  • 公开/公告号KR20040108578A

    专利类型

  • 公开/公告日2004-12-24

    原文格式PDF

  • 申请/专利权人 YAMAMOTO-MS CO. LTD.;

    申请/专利号KR20040039944

  • 发明设计人 YAMAMOTO WATARU;

    申请日2004-06-02

  • 分类号C25D21/10;

  • 国家 KR

  • 入库时间 2022-08-21 22:06:20

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