PLASMA CHAMBER FOR AVOIDING POSSIBILITY OF PLASMA ARCING DUE TO EXPOSURE OF A COUPLING UNIT FOR COUPLING AN INSIDE OF A CHAMBER WALL AND AN INNER JACKET

摘要

PURPOSE: A plasma chamber is provided to avoid possibility of plasma arching due to exposure of a coupling unit for coupling an inside of a chamber wall and an inner jacket by shielding the coupling unit. CONSTITUTION: A plasma chamber comprises a chamber wall(110) and an inner jacket unit(120) installed on the inside of the chamber wall. The inner jacket unit includes the first sub-jacket(120a) and the second sub-jacket(120b). The first sub-jacket has grooves at both lateral sides, wherein the first groove wall is in contact with the chamber wall and the second groove wall is not in contact with the chamber wall. The first groove wall is extended wider than the second groove wall. The first sub-jacket is coupled to the inside of the chamber wall with screw threads. The second sub-jacket has a protruding part inserted in the groove of the first sub-jacket, thereby being coupled to the inside of the chamber wall. Herein, the second sub-jacket covers the first groove wall of the first sub-jacket, thereby shielding the screw threads.