APPARATUS OF MEASURING HORIZONTAL STATE OF WAFER CHUCK FOR RAPIDLY PERFORMING HORIZONTAL ADJUSTMENT PROCESS BY DETECTING HORIZONTAL STATE OF WAFER CHUCK WITHOUT MOVING WAFER CHUCK

摘要

PURPOSE: An apparatus of measuring a horizontal state of a wafer chuck is provided to perform rapidly a horizontal adjustment process by detecting the horizontal state of the wafer chuck without moving the wafer chuck. CONSTITUTION: A measuring unit(110) is in contact with a wafer chuck to measure a horizontal degree. The measuring unit is loaded on a loading unit(120). A supporting unit(130) supports the loading unit. The measuring unit includes a center gauge(112) to measure a horizontal state of a center part of the wafer chuck. The measuring unit further includes two edge gauges(114) to measure horizontal states of edge parts of the wafer chuck.