APPARATUS FOR GENERATING HYBRID COUPLED PLASMA, ESPECIALLY OVERCOMING LIMITATION OF CONVENTIONAL ICP TYPE OR CCP TYPE

摘要

PURPOSE: An apparatus for generating the hybrid coupled plasma is provided to generate the hybrid coupled plasma(HCP) as a middle state between the inductive coupled plasma(ICP) and the capacitive coupled plasma(CCP). CONSTITUTION: An apparatus for generating the hybrid coupled plasma includes a chamber(100), a high frequency power source, an insulation plate(320), an antenna(340), an electrode(360) and a variable capacitor(380). The substrate(W) is installed on the electrostatic chuck(600) in the chamber and a gas injection nozzle(200) is installed inside of the chamber. The high frequency power source applies the power. The insulation plate is formed on the top surface of the gas injection nozzle. The antenna is formed on the top surface of the insulation plate to receive the power from the high frequency power source. The electrode is formed on the top surface of the antenna. And, the variable capacitor is connected between one of the first and the second antennas and the high frequency power.