WAFER CONVEYING APPARATUS FOR CLEANING SEMICONDUCTOR WAFER AND METHOD OF CLEANING SEMICONDUCTOR WAFER USING THE SAME FOR PREVENTING GENERATION OF WATER MARKS ON SEMICONDUCTOR WAFER

摘要

Purpose: for cleaning a wafer transmission set of semiconductor piece and a kind of entering the washmarking that semiconductor piece is arranged to prevent from generating on a semiconductor chip by injecting deionized water during a wafer transfer process for cleaning the method using identical semiconductor piece. Construction: a robot body (310) is moved horizontally between multiple bathtubs including the first bath for storing a cleaning chemistry solution, one second molten bath, is used to store deionized water as a rinsing solution. One robot arm extends from robot body, for additional or separation semiconductor piece. One deionized water power unit provides deionized water to semiconductor chip, when semiconductor piece is conveyed from one bath to other bathtubs.