首页> 外国专利> APPARATUS AND METHOD FOR INSPECTING DEFECTS CAPABLE OF IMPROVING ACCURACY IN DEFECT INSPECTION AND REDUCING INSPECTION TIME

APPARATUS AND METHOD FOR INSPECTING DEFECTS CAPABLE OF IMPROVING ACCURACY IN DEFECT INSPECTION AND REDUCING INSPECTION TIME

机译:用于检查能够提高准确性的缺陷和减少检查时间的缺陷的设备和方法

摘要

PURPOSE: An apparatus and a method for inspecting defects are provided to improve accuracy in defect inspection and reduce inspection time by calculating an optimal amplification ratio based on regional characteristics on an object to be inspected. CONSTITUTION: An apparatus for inspecting defects includes a stage(140), a light emitter(110), a detector(130), a controller(160), and a determiner(170). The stage supports and transfers an object to be inspected. The light emitter is apart from the stage by a predetermined distance and sequentially illuminates a light to at least two regions on the object to be inspected. The detector collects the light reflected from the object to be inspected and amplifies the collected light by an amplification ratio. The controller varies the amplification ratio according to regional characteristics corresponding to a variance of the amplified light. The determiner analyzes the amplified light and determines an error on the object to be inspected.
机译:目的:提供一种用于检查缺陷的设备和方法,以通过基于待检查对象的区域特性计算最佳放大率来提高缺陷检查的准确性并减少检查时间。构成:一种用于检查缺陷的设备,包括平台(140),发光器(110),检测器(130),控制器(160)和确定器(170)。载物台支撑并转移要检查的物体。发光器与台架相距预定距离,并顺序地将光照射到要检查的物体上的至少两个区域。检测器收集从要检查的物体反射的光,并以放大率将收集的光放大。控制器根据与放大光的方差相对应的区域特性来改变放大率。确定器分析放大的光并确定要检查的物体上的误差。

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