COMPOSITION FOR ORGANIC DIFFUSED REFLECTION PREVENTION FILM FORMATION WITH STABILIZING ULTRAFINE PATTERNS

摘要

PURPOSE: Provided is a composition for forming an organic diffused reflection prevention film which is formed in the lower part of a photoresist film to absorb exposure light so that it increases evenness of ultrafine patterns in semiconductor. CONSTITUTION: The composition for organic diffused reflection prevention film formation comprises the components of: photoabsorber which includes polyvinyl phenol salts represented by formula 1, in which a and b is polymerization degree, a+b is an integer of 10-800, b is an integer of 10-800 and R is H or C1-C4 alkyl group; cross-linking agents which form a film by cross-linking function; catalysts which promote cross-linking reaction of the cross-linking agents; and solvent.