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METHOD FOR FORMING PG FILM BY CVD USING ACETYLENE GAS AND METHANE GAS AS MAIN REACTION GAS

机译:以乙炔气和甲烷气为主要反应气的CVD法形成PG膜的方法

摘要

A kind of purpose: method, for forming the membrane electrode or a film resistance that PG (pyrolytic graphite) film is configured for use as ceramic membrane by CVD (chemical vapor deposition), by using acetylene gas, methane gas, alakan gases and olefinic appropriate hydrocarbon gas as main reaction gas. Construction: a pyrolytic graphite film is formed in the BN films by CVD. By using acetylene gas, (C2H2 is formed in 0. pyrolytic graphite film1000 Dao 2300C temperature under the pressure of 1 to 500 supports: 9.9995), methane gas (CH4: 9.9995), the alakan gases and olefinic appropriate hydrocarbon gas as main reaction gas, hydrogen (H2), helium and argon gas (Ar) as delivery gas.
机译:一种目的:通过使用乙炔气,甲烷气,阿拉坎气和烯烃气,通过CVD(化学气相沉积)形成膜电极或将PG(热解石墨)膜构造为陶瓷膜的膜电阻的方法适当的烃类气体作为主要反应气体。构造:通过CVD在BN膜中形成热解石墨膜。通过使用乙炔气(在0至1到500的压力下,在0.300的热解石墨膜中生成C2H2。9.993),甲烷气体(CH4:9.9995),阿拉康气体和适合于烯烃的烯烃气体作为主要反应气体,氢气(H2),氦气和氩气(Ar)作为输送气体。

著录项

  • 公开/公告号KR20050019571A

    专利类型

  • 公开/公告日2005-03-03

    原文格式PDF

  • 申请/专利权人 CHANG MIN SEOK;

    申请/专利号KR20030057411

  • 发明设计人 CHANG MIN SEOK;

    申请日2003-08-19

  • 分类号H01L21/205;

  • 国家 KR

  • 入库时间 2022-08-21 22:05:47

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