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METHOD FOR MANUFACTURING CANTILEVER FOR ATOMIC FORCE MICROSCOPE HAVING FIELD EFFECT TRANSISTOR STRUCTURE FOR OBTAINING CANTILEVER HAVING MICRO CHANNEL
METHOD FOR MANUFACTURING CANTILEVER FOR ATOMIC FORCE MICROSCOPE HAVING FIELD EFFECT TRANSISTOR STRUCTURE FOR OBTAINING CANTILEVER HAVING MICRO CHANNEL
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机译:具有具有微通道的悬臂的制造具有场效应晶体管结构的原子力显微镜的悬臂的方法
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摘要
PURPOSE: A method for manufacturing a cantilever for an atomic force microscope having a field effect transistor structure is provided to obtain the cantilever having a micro channel without using an electric beam lithography process. CONSTITUTION: A method includes a step of forming a probe(204) on an upper surface of a second silicon layer of an SOI substrate, on which a first silicon layer, a first insulation layer, and the second silicon layer are sequentially deposited. A second insulation layer, a third insulation layer, a polysilicon layer, and a photoresist layer are sequentially stacked on the second silicon layer including the probe(204). A first mask pattern of a cantilever for an atomic force microscope is formed on an upper surface of the polysilicon layer by removing the photoresist layer through a photolithography process.
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