METHOD FOR MAKING PREDICTION MODEL OF PROCESS PROXIMITY EFFECT, METHOD FOR CONTROLLING PROCESS, METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING PHOTOMASK TO IMPROVE PREDICTION PRECISION

摘要

PURPOSE: A method for making a prediction model of a process proximity effect is provided to improve prediction precision by determining an undecided parameter in a prediction model based upon a predetermined repeated pattern and a pattern with a predetermined dimension. CONSTITUTION: With respect to a repetition pattern composed of repeated basic patterns, a modeling pattern group composed of a plurality of repetition patterns are prepared which is obtained by varying the first dimension for prescribing the basic pattern and the second dimension for prescribing the repetition of the basic pattern. A predetermined repetition pattern is selected from the modeling pattern group wherein a basic pattern among the predetermined repetition pattern corresponds to the pattern having a predetermined dimension formed on a wafer. An undecided parameter in a prediction model is determined based upon a predetermined repeated pattern and a pattern with a predetermined dimension.