TEMPERATURE CONTROL DEVICE OF LAMP HOUSE IN WWE PROCESS AND METHOD THEREIN

摘要

The present invention wafer edge exposure lamp to house a temperature controlled to an apparatus and temperature control method, at the wafer edge exposure process for exposing the edge portion of the photolithography process of the wafer to form a pattern on the wafer is irradiated to a wafer in the lamp housing for generating light, wherein the lamp house is to improve the conventional cooling means to prevent overheating by the light generated inside, the branch lines for supplying the clean dry air in the semiconductor production equipment lamp by providing the inner house, the effective features to prevent overheating of the lamp housing without the need for a separate box for installation of the equipment.