INDUCTIVELY COUPLED PLASMA PROCESSING APPRATUS HAVING ELECTRO-MAGNET

摘要

The present invention relates to invite area plasma generation device using a magnetic field, and equipped with a stage on which the substrate is mounted etching reaction chamber; A plurality of antenna rod first and second antenna are each other opposed cross doedoe are arranged in parallel, consisting of an antenna source connected; in the induction consisting coupled plasma generating apparatus, is a plurality of magnetic material provided on the antenna rod top to work as an antenna source by it is possible to increase the uniformity of the plasma, it is possible to adjust the spacing of the antenna according to the size of the substrate can maintain an improved uniformity.