Method and apparatus for removing a reaction by-product in the semiconductor and the liquid crystal display manufacturing field

摘要

PURPOSE: A reaction residues removal apparatus is provided to improve a stability and a through-put by removing reaction residues included in gas bubbles through a physical and a chemical processing method. CONSTITUTION: A reaction residues removal apparatus(30) comprises an influx pipe(32) for supplying gas bubbles(33) including a reaction gas exhausted from a CVD(Chemical Vapor Deposition) step and reaction residues into a chamber body(31), the chamber body(31) installed with networks(36,37,38,39) for respectively destructing the gas bubbles(33) and a gas outlet(40) having a vacuum pump connected with the upper portion of the chamber body(31).