A vacuum evaporation apparatus and design method of shield member for vacuum evaporation apparatus

摘要

PURPOSE: A deposition apparatus and a method of designing a shield member for the same are provided to optimize the uniformity of the thickness of a deposited thin film by forming an optimized shape of the shield member. CONSTITUTION: A deposition apparatus includes a substrate(110), an evaporation source(120), and a shield member(140). The substrate(110) is rotatably installed in the inside of a vacuum chamber(130). The evaporation source(120) is installed at a lower part of the substrate(110) in order to heat an evaporation material and evaporate the evaporation material. The shield member(140) is installed between the substrate(110) and the evaporation source(120) in order not to expose each track of the substrate(110) to the evaporation material. Both sides of the shield member(140) have a first complex curvature and a second complex curvature, respectively.