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Fabrication Method of GaN related LED using Substrate Remove Technology

机译:利用衬底去除技术制备GaN相关LED的方法

摘要

The present invention relates to a GaN-based LED production of a new structure for improving the non-uniform current distribution problems in the conventional AlGaInN-based low external quantum efficiency of the LED (External Quantum Efficiency), the thermal problems, and the active layer. The unique characteristics of the proposed structure is a GaN-based LED thin film used for the growth substrate has gotten N- doped GaN thin film and exposed to remove the (Al 2 O 3, SiC, Si ...), because of the substrate removed N- form a metal and a way to make the two metal parts P- junction by flip attached to the silicon substrate manufacturing the LED. The advantage of this structure is to solve the absorbent matter of the optical output, and further thinned LED thickness to less than 10um by light loss to the substrate in the removal of the substrate due to the difference in dielectric constant (Dielectric Constant) between the substrate and the GaN interface due possible to improve the external quantum efficiency (external quantum efficiency) to occur effectively optical playback (Photon Recycling) inside the LED device, and, since the heat generated from the LED across the board can easily fall into the silicon substrate through the metal of the element P- It can significantly improve the thermal properties. In addition, it is possible to significantly improve the general problems of non-uniform distribution current within the active layer of the device that appears due to the low P- doping problem with topical P- metal forming and metal forming N- problem of the GaN-based LED.; The invention is attached upside down to be in, the P- metal contacts the substrate after the step of forming the P- metal on a thin film over the doped P- silicon (Si) substrate for making GaN-type LED having a PN junction diode structure after removing the substrate by using the proposed method in the present invention to form a N- N- doped GaN thin film on the metal exposed by removing the substrate is characterized in that to produce the LED.
机译:本发明涉及基于GaN的LED的新结构的生产,该结构用于改善传统的基于AlGaInN的LED的低外部量子效率(外部量子效率)中的非均匀电流分布问题,热问题和有源器件。层。所提出的结构的独特特征是用于生长衬底的GaN基LED薄膜已获得N掺杂的GaN薄膜并暴露以去除 (Al 2 O 3,SiC, Si ...),因为去除了衬底的N-形成了一种金属,并且通过倒装连接到制造LED的硅衬底上使两个金属部分形成P-结。这种结构的优点是解决了光输出的吸收性问题,并且由于去除了基板之间的介电常数(介电常数)之间的差异,在去除基板时由于基板的光损失而使LED的厚度进一步减薄至小于10um。基板和GaN界面可能会改善外部量子效率(外部量子效率),从而有效地在LED器件内部发生光学回放(光子回收),并且由于LED从整个板上产生的热量很容易掉入硅中通过元素P-的金属衬底可以显着改善其热性能。另外,可以显着改善由于有源P-GaN的低P-掺杂问题和GaN的金属N-问题而导致的器件有源层中出现的分布电流不均匀的一般问题。的LED。在将本发明的P-金属倒置在掺杂的P-硅(Si)衬底上方的薄膜上形成P-金属以制造具有PN结的GaN型LED的步骤之后,将本发明上下颠倒地附接。通过使用本发明中提出的方法在去除衬底之后在通过去除衬底而暴露的金属上形成N-N-掺杂的GaN薄膜的二极管结构的特征在于,制造LED。

著录项

  • 公开/公告号KR100482174B1

    专利类型

  • 公开/公告日2005-04-13

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20010047806

  • 发明设计人 유태경;

    申请日2001-08-08

  • 分类号H01L33/00;H01L21/30;

  • 国家 KR

  • 入库时间 2022-08-21 22:04:00

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