Method of fabricating a chemical mechanical polishing pad conditioner using ceramic material and chemical mechanical polishing pad conditioner fabricated thereby

摘要

PURPOSE: A method for fabricating a CMP pad conditioner using a ceramic material and a CMP pad conditioner fabricated thereby are provided to enhance tolerance to acid slurries and alkali slurries by using a ceramic layer having acid-resistant property and alkali property. CONSTITUTION: Polishing particles are arranged on a metal substrate(101). A sacrificial metal layer is selectively formed on the metal substrate between the polishing particles(103). The metal substrate is removed therefrom. A ceramic layer is formed to cover the polishing particles and the sacrificial metal layer and hold the polishing particles(105,107). The polishing particles are projected by removing the sacrificial metal layer(109). The ceramic layer is bonded to a metal shank(111).