Method static decay apparatus and a static decay of plasma etching equipment

摘要

When the through-hole at least one having a predetermined diameter in the center is formed to be charged etching the object of the plasma etching process, lift discloses a lower electrode of the plasma etching equipment is a predetermined gas through-out alone, for the lower electrode and the lower electrode connected to the through-holes with each pipe and discloses apparatus for static decay of plasma etching equipment having a gas supplier to control the amount and the etching object is supplied through a predetermined gas alone when the lifting charge from the plasma etching process.; Thus, it is possible to safely lift a glass unloading to loading, exit the plasma etching, it is possible to secure the safety of the glass, there is an effect that the yield is thus improved, thereby improving the processing environment.