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UNIT STREAM GAS liquid metal handling and filtration

机译:UNIT STREAM GAS液态金属处理和过滤

摘要

1.the device (1) for processing the stream of liquid metal with the ladle (2) processing, containing a working chamber (20), means (7, 9) and the inlet means (8, 10) of the liquid crystal meth alla, means (11, 12, 13, 14) u0441u043eu0435u0434u0438u043du0435u043du0438u00a0 with at least one pitcher liquid metal u0436u0435u043bu043eu0431u043eu043c (15) and at least one u043eu0442u0432u043eu0434u00a0u0449u0438u043c liquid metal u0436u0435u043bu043eu0431u043eu043c (16) and means a (22, 22 a,22b) u0432u0434u0443u0432u0430u043du0438u00a0 manufacturing gas in liquid metal, executed in at least one lateral wall (32, 33) of bucket (2), with each of the inlet means and you ignition of liquid metal includes at least one opening (9, 10) located in such a way that it completely was under the level of liquid metal in (26). u0432u0440u0435u043cu00a0 processing u0434u043bu00a0,to avoid u043fu043eu043fu0430u0434u0430u043du0438u00a0 ambient air in the working chamber in u0432u0440u0435u043cu00a0 processing, u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0, u0443u043au0430u0437u0430u043du043du0430u00a0 u0440u0430u0431u043eu0447u0430u00a0 chamber (20) is located their higher flow part (23) and located below the flow part (24) and the means (22, 22 a, 22b) u0432u0434u0443u0432u0430u043du0438u00a0 are located above the flow part (2) 3)u0443u043au0430u0437u0430u043du043du0430u00a0 u0440u0430u0431u043eu0447u0430u00a0 luggage (20) further includes at least a first tool (40) is installed in the lower part of a thread (24), and decree u043du043du044bu0435 u043eu0442u0432u0435u0440u0441u0442u0438u00a0 (9, 10) located near the bottom (28) of the working chamber.;2. the device (1) for processing u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0 1, so that u0432u043fu0443u0441u043au043du043eu0435 hole (9) and the outlet (10) u0434u043bu00a0 liquid metal are placed in the opposite end u0441u0442u0435u043du043a ah (29, 30) of bucket (2).;3. the processing device (1) for 1 or 2, u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0, means (22, 22 a, 22b) u0432u0434u0443u0432u0430u043du0438u00a0 localized near the bottom (28) of the working chamber (20).;4. the processing device (1) for 1 or 2, u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0, means (22, 22 a, 22b) u0432u0434u0443u0432u0430u043du0438u00a0 accommodated in the line.;5. the processing device (1) for 1 or 2, u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0, means (22, 22 a, 22b) u0432u0434u0443u0432u0430u043du0438u00a0 placed in the two side walls (32, 33) of the working chamber (20).;6. the device (1) for processing according to clause 5, u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0, means (22, 22 a, 22b) u0432u0434u0443u0432u0430u043du0438u00a0 posted u0447u0435u0440u0435u0434u0443u044eu0449u0438u043cu0441u00a0 manner in the two side walls (32, 33) of the working chamber (20).;7. the processing device (1) for 1, u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0, means (22, 22 a, 22b) u0432u0434u0443u0432u0430u043du0438u00a0 u043fu0440u0435u0434u0441u0442u0430u0432u043bu00a0u044eu0442 a nozzle.;8. the processing device (1) for 1, u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0, means (22, 22 a, 22b) u0432u0434u0443u0432u0430u043du0438u00a0 u00a0u0432u043bu00a0u044eu0442u0441u00a0 u043eu0440u0438u0435u043du0442u0438u0440u0443u0435u043cu044bu043cu0438.;9. the device (1) for u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0 processing 1, the first a tool (40) u043fu0440u0435u0434u0441u0442u0430u0432u043bu00a0u0435u0442 a stove.;10. the device (1) for processing u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0 p.9, so that the plate contains a ceramic foam.;11. the device (1) for processing on p.10, u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0, the porosity of solid ceramic u043fu0435u043du043eu043cu0430u0442u0435u0440u0438u0430u043bu0430 u0441u043eu0441u0442u0430u0432u043bu00a0u0435u0442 a 4 inch long.;12. the device (1) for processing u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0 p.9, so that it contains at least one second filter dynamics stove (41) located below the flow of the first filter it consistent plate (40).;13. the device (1) for processing u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0 p.9, so that u043au0430u0436u0434u0430u00a0 plate forms the angle relative to the line, u043fu0435u0440u043fu0435u043du0434u0438u043au0443u043bu00a0u0440u043du043eu0439 to the main axis (6) of the working chamber, etc. i'll bring this corner u0441u043eu0441u0442u0430u0432u043bu00a0u0435u0442 from 20 to 90.;14. the device (1) for processing u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0 1, so that it contains a deflector sheet (42) between a higher flow part (23) of the working chamber (20) and the first phil u044cu0442u0440u0443u044eu0449u0438u043c tool (40) u0434u043bu00a0 u043eu0433u0440u0430u043du0438u0447u0435u043du0438u00a0 turbulence near the surface of the filter media.;15. the device (1) for u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0 processing 1, so that the length lg is higher flow part (23) of the working chamber (20) u0441u043eu0441u0442u0430u0432u043bu00a0u0435u0442 from 30 to 90% of the internal length lo u0443u043au0430u0437u0430u043du043d oh the working chamber.;16. the device (1) for u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0 processing 1, so that the length lg is higher flow part (23) of the working chamber (20) u0441u043eu0441u0442u0430u0432u043bu00a0u0435u0442 from 50 to 80% of the internal length lo u0443u043au0430u0437u0430u043du043d oh the working chamber.;17. the application of the device (1) for processing on any of the u043fu043f.1u201316 u0434u043bu00a0 processing flow of the liquid metal.;18. application of u043eu0442u043bu0438u0447u0430u044eu0449u0435u0435u0441u00a0 p.17, so that the metal is selected from the group u0441u043eu0441u0442u043eu00a0u0449u0435u0439 of u0430u043bu044eu043cu0438u043du0438u00a0 u043cu0430u0433u043du0438u00a0, aluminium alloy or magnesium alloy.
机译:1,用钢包(2)处理液体金属流的装置(1),包括工作室(20),液晶装置(7、9)和入口装置(8、10) alla,表示(11、12、13、14) u0441 u043e u0435 u0434 u0438 u043d u0435 u043d u0438 u00a0具有至少一种水罐液态金属 u0436 u0435 u043b u043e u0431 u043e u043c(15)和至少一个 u043e u0442 u0432 u043e u0434 u00a0 u0449 u0438 u043c液态金属 u0436 u0435 u043b u043e u0431 u043e u043c(16)表示(22、22 a,22b)在液态桶(2)的至少一个侧壁(32、33)中执行的液态金属制造气体,分别是点燃液态金属时,至少要包括一个开口(9、10),该开口应完全位于(26)中液态金属的液面以下。 u0432 u0440 u0435 u043c u00a0处理 u0434 u043b u00a0,以避免 u0432 u0440 工作室中的环境空气 u043f u043e u043f u0430 u0434 u0430 u043d u0438 u00a0 u0435 u043c u00a0处理, u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0, u0443 u043a u0430 u0430 u0437 u0430 u043d u043d u043d u0430 u0440 u0430 u0431 u043e u0447 u0430 u00a0腔室(20)位于其较高的流量部分(23)并位于流量部分(24)和装置(22、22a,22b)的下方u0434 u0443 u0432 u0430 u043d u0438 u00a0位于流动部分(2)3上方) u0443 u043a u0430 u0437 u0430 u043d u043d u0430 u00a0 u0440 u0430 u0431 u043e u0447 u0430 u00a0行李箱(20)进一步包括至少一个安装在螺纹(24)下部的第一工具(40),以及法令 u043d u043d u043b u0435 u043e u0442 u0432 位于工作腔底部(28)附近的u0435 u0440 u0441 u0442 u0438 u00a0(9,10); 2。用于处理 u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0 1的设备(1),这样 u0432 u043f u0443 u0443 u0441 u0431 u043a u043d u043e u0435孔(9)和出口(10) u0434 u043b u00a0液态金属放置在料斗(2)的另一端(29,30)的相对端 u0441 u0442 u0435 u043d u043a。; 3。用于1或2的处理设备(1), u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0,表示(22,22 a,22b) u0432 u0434 u0443 u0432 u0430 u043d u0438 u00a0位于工作室(20)的底部(28)附近;; 4。用于1或2的处理设备(1), u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0,表示(22,22 a,22b) u0432 u0434 该行中容纳的u0443 u0432 u0430 u043d u0438 u00a0; 5。用于1或2的处理设备(1), u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0,表示(22,22 a,22b) u0432 u0434 u0443 u0432 u0430 u043d u0438 u00a0放置在工作室(20)的两个侧壁(32、33)中; 6。根据条款5进行处理的设备(1), u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0,表示(22,22 a,22b) u0432 u0434 u0443 u0432 u0430 u043d u0438 u00a0已张贴在两个侧壁(32、33)的 u0447 u0435 u0440 u0435 u0434 u0443 u044e u0449 u0438 u043c u0441 u00a0方式中工作室(20).; 7。 1的处理设备(1) u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0,表示(22,22 a,22b) u0432 u0434 u0443 u0432 u0430 u043d u0438 u00a0 u043f u0440 u0435 u0434 u0441 u0442 u0430 u0432 u043b u00a0 u044e u0442一个喷嘴。; 8。 1的处理设备(1) u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0,表示(22,22 a,22b) u0432 u0434 u0443 u0432 u0430 u043d u0438 u00a0 u00a0 u0432 u043b u00a0 u044e u0442 u0441 u00a0 u043e u0440 u0438 u0435 u043d u0432 u0442 u0438 u0440 u0443 u0435 u0435 u043c u0438。; 9。设备(1)用于 u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0处理1,第一个工具(40) u043f u0440 u0435 u0434 u0431 u0442 u0430 u0432 u043b u00a0 u0435 u0442炉子; 10。 p.9的设备(1)用于处理 u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0 p.9; 11。在第10页上处理的设备(1), u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0,固体陶瓷的孔隙率 u043f u0435 u043d u043e u043c u0430 u0442 u0435 u0440 u0438 u0430 u043b u0430 u0441 u043e u0441 u0442 u0430 u0432 u043b u00a0 u0435 u0442长4英寸; 12。用于处理 u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0 p.9的设备(1),因此它至少包含一个位于第二个过滤器动态加热炉(41)低于第一个过滤器流量的位置是一致的板(40).; 13。用于处理 u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0 p.9的设备(1),这样 u043a u0430 u0436 u0436 u0434 u0430 u00a0板相对于线形成角度, u043f u0435 u0440 u043f u0435 u043d u0434 u0438 u043a u0443 u043b u00a0 u0440 u043d u043e u0439等到工作室的主轴(6)等位置。将这个角 u0441 u043e u0441 u0442 u0430 u0432 u043b u00a0 u0435 u0442从20变为90。14。用于处理 u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0 1的设备(1),以便在较高流量部分(23)之间包含一个导流板(42)。 )和第一个phil u044c u0442 u0440 u0443 u044e u0449 u0438 u043c工具(40) u0434 u043b u00a0 u043e u0433 u0440 u0430 u043d u043d u0447 u0435 u043d u0438 u00a0过滤介质表面附近的湍流; 15。用于处理1的设备(1),长度lg为工作室的较高流通部分(23)(1),用于处理(1)。 20) u0441 u043e u0441 u0442 u0430 u0432 u043b u00a0 u0435 u0442是内部长度的30%至90%lo u0443 u043a u0430 u0437 u0430 u043d u043d 。; 16。用于处理1的设备(1),长度lg为工作室的较高流通部分(23)(1),用于处理(1)。 20) u0441 u043e u0441 u0442 u0430 u0432 u043b u00a0 u0435 u0442是内部长度的50%至80%lo u0443 u043a u0430 u0437 u0430 u043d u043d 。; 17。装置(1)在液态金属加工流程中的任何一个上的应用; 18。 u043e u0442 u043b u0438 u0447 u0430 u044e u0449 u0435 u0435 u0441 u00a0 p.17的应用,因此金属选自 u0441 u043e u0441 u0441 u0442 u043e 铝合金或镁合金的 u0430 u043b u044e u043c u0438 u043d u0438 u00a0 u043c u0430 u0433 u043d u0438 u00438的u00a0 u0449 u0435 u0439。

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