首页> 外国专利> Slip for producing long-lasting mold release layer, useful on mold for casting nonferrous metal under pressure, comprises boron nitride suspension in silanized silica in organic solvent or aqueous colloidal zirconia, alumina or boehmite

Slip for producing long-lasting mold release layer, useful on mold for casting nonferrous metal under pressure, comprises boron nitride suspension in silanized silica in organic solvent or aqueous colloidal zirconia, alumina or boehmite

机译:用于生产持久脱模层的浆料,可用于在压力下铸造有色金属的模具中使用,其中包括氮化硼在有机溶剂中或硅酸铝水溶液,氧化铝或勃姆石中的硅烷化二氧化硅悬浮液

摘要

Slip for producing long-lasting mold release layers contains (A) inorganic binder with colloidal inorganic particles based on silicon (Si), zirconium or aluminum oxide or boehmite, where (i) binders based on Si oxide contain silane(s) with hydrolysable groups and substoichiometric amount of water, (ii) others contain water as solvent and form nanocomposite sol, (B) boron nitride suspension in medium and (C) medium of (i) organic solvent or (ii) water. Slip for producing mold release layers with long-term stability contains (A) inorganic binder containing colloidal inorganic particles based on silicon (Si), zirconium (Zr) or aluminum (Al) oxide, boehmite or a mixture with inorganic filler selected from Si, titanium, Zr, Al, yttrium, cerium, tin and iron oxides, AlOOH and carbon, where (i) binder containing colloidal inorganic particles based on Si oxide also contains silane(s) of formula (I) and less than stoichiometric amounts of water with respect to the hydrolysable groups in (I) or (ii) binder free from particles based on Si oxide also contains water as solvent and forms a nanocomposite sol under sol-gel process conditions, (B) a suspension of boron nitride (BN) particles in (i) an organic solvent or (ii) water and (C) (i) an organic solvent or (ii) water: R x-Si-A 4-x(I); A : hydrolysable groups selected from hydrogen, halogens, hydroxyl and (un)substituted 2-20 C alkoxy, 6-22 C aryloxy, alkylaryloxy, acyloxy and alkylcarbonyl groups; R : unhydrolysable groups selected from 1-20 C alkyl, 2-20 C alkenyl, 2-20 C alkynyl, 6-22 C aryl, alkaryl and arylalkyl groups; x : 0, 1, 2, 3 such that x is 1 or more in not less than 50% of the silanes . Independent claims are also included for the following: (1) production of the slip; (2) mold release layers with long-term stability produced from the slip as 0.5-250 mu m thick hardened layer; (3) production of the release layers.
机译:用于生产持久脱模层的浆料包含(A)具有基于硅(Si),锆或氧化铝或勃姆石的胶体无机颗粒的无机粘合剂,其中(i)基于Si氧化物的粘合剂包含具有可水解基团的硅烷(ii)其他含有水作为溶​​剂并形成纳米复合溶胶,(B)在(i)有机溶剂或(ii)水的介质和(C)介质中的氮化硼悬浮液。用于生产具有长期稳定性的脱模层的浆料包含(A)无机粘合剂,该粘合剂包含基于硅(Si),锆(Zr)或铝(Al)氧化物的胶体无机颗粒,勃姆石或与选自Si的无机填料的混合物,钛,Zr,Al,钇,铈,锡和铁的氧化物,AlOOH和碳,其中(i)包含基于氧化硅的胶态无机颗粒的粘结剂也包含式(I)的硅烷和少于化学计量的水关于(I)或(ii)中不含基于氧化硅的颗粒的粘合剂中的可水解基团,还含有水作为溶​​剂并在溶胶-凝胶工艺条件下形成纳米复合溶胶,(B)氮化硼(BN)的悬浮液(i)有机溶剂或(ii)水和(C)(i)有机溶剂或(ii)水中的颗粒:R x-Si-A 4-x(I); A:选自氢,卤素,羟基和(未)取代的2-20 C烷氧基,6-22 C芳氧基,烷基芳氧基,酰氧基和烷基羰基的可水解基团; R:不可水解的基团,其选自1-20个碳的烷基,2-20个碳的烯基,2-20个碳的炔基,6-22个碳的芳基,烷芳基和芳基烷基; x:0、1、2、3,使得在不少于50%的硅烷中x为1或更大。还包括以下方面的独立权利要求:(1)凭条的产生; (2)由滑移产生的具有长期稳定性的脱模层为0.5-250μm厚的硬化层; (3)生产离型层。

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