Production of insulating regions in semiconductor memories comprises forming a hard mask with openings in a region of a stronger electrical insulation and in a region of a weaker electrical insulation on a substrate, and further processing

摘要

Production of insulating regions in semiconductor memories comprises forming a hard mask (4) with openings (7) in the region of a stronger electrical insulation and in the region of a weaker electrical insulation on a substrate (1), closing the openings in the region of weaker electrical insulation using a filler (10), etching trenches in the substrate using the mask, removing the filler, etching again, removing the mask and filling the trenches with a dielectric.