首页> 外国专利> Coating reaction mixture containing target molecules onto microarray of interceptor molecules, provides molecules with protective groups which are removed after coating

Coating reaction mixture containing target molecules onto microarray of interceptor molecules, provides molecules with protective groups which are removed after coating

机译:将含有靶分子的反应混合物涂覆到拦截分子的微阵列上,提供具有保护基的分子,涂覆后将其去除

摘要

Coating reaction mixture containing target- or interceptor molecules are provided with protective groups. The mixture is coated, to cover the microarray completely. Protection is then removed from the molecules provided with protective groups. Interceptor- (3) and target molecules (7) comprise nucleic acids. These and the protective groups (4), comprise nucleic acids. The interceptor molecules form interceptor-target-hybrids with target molecules, having melting points in a temperature range Tm1. The interceptor- or target molecules used, form protective hybrids with protective groups, having a melting points in a temperature range Tm2. The Tm2 range, lies below the Tm1 range. The interval between ranges is 0-40 [deg] C. The first stage is carried out at T1 below Tm2 and the third stage at a temperature T2 greater than Tm2. Interceptor molecules, target molecules and protective groups are proteins, modified proteins, DNA, cDNA, RNA, tRNA, LNA, PNA, aRNA or combinations of them. The protective groups are bound covalently. The protective groups attach themselves to the interceptor- or target molecules. The first stage is accomplished by intentional alteration of the secondary or tertiary structure of interceptor- and/or target molecules. This is canceled when removing the protection. These stages are accomplished by altering physical magnitudes and/or chemical reaction. An independent claim is included for the corresponding microarray.
机译:含有靶分子或拦截分子的包衣反应混合物具有保护基。涂覆混合物,以完全覆盖微阵列。然后从具有保护基的分子上除去保护。拦截器(3)和靶分子(7)包含核酸。这些和保护基团(4)包含核酸。拦截分子与目标分子形成拦截目标-杂化物,其熔点在温度范围Tm1中。所使用的拦截分子或目标分子形成具有保护基的保护性杂化物,其熔点在温度Tm2范围内。 Tm2范围低于Tm1范围。范围之间的间隔是0-40℃。第一阶段在低于Tm2的T1进行,第三阶段在大于Tm2的温度T2进行。拦截分子,靶分子和保护基是蛋白质,修饰的蛋白质,DNA,cDNA,RNA,tRNA,LNA,PNA,aRNA或它们的组合。保护基共价结合。保护基将其自身附着在拦截分子或目标分子上。通过故意改变拦截分子和/或靶分子的二级或三级结构来完成第一阶段。删除保护时将取消此操作。这些阶段是通过改变物理量和/或化学反应来完成的。对于相应的微阵列包括独立权利要求。

著录项

  • 公开/公告号DE10343540A1

    专利类型

  • 公开/公告日2005-04-14

    原文格式PDF

  • 申请/专利权人 ALOPEX GMBH;

    申请/专利号DE2003143540

  • 发明设计人 MANN WOLFGANG;

    申请日2003-09-19

  • 分类号C12Q1/68;

  • 国家 DE

  • 入库时间 2022-08-21 22:01:14

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