Lithography illumination device uses focussing optic with end lens producing focal points of light irradiation from each laser beam source close to light-sensitive layer

摘要

The illumination device for producing illuminated structures in a light-sensitive layer uses a focussing optic (24) with end lens which produces close to the light-sensitive layer (32) focal points of the light irradiation emerging from each of the laser beam sources. To produce the illumination spots a laser beam field spreads out in the direction of the light-sensitive layer and has a power density which in the conversion region in the light sensitive layer leads to the formation of a channel penetrating into the light-sensitive layer with a refraction index, which is increased by the Kerr effect relative to its environment, and guides the respective laser irradiation field in a spatially defined manner.