首页> 外国专利> Filter element production involves applying membrane layer to substrate, etching membrane chamber to leave residual layer of substrate, producing pores in membrane layer, and removing residual layer

Filter element production involves applying membrane layer to substrate, etching membrane chamber to leave residual layer of substrate, producing pores in membrane layer, and removing residual layer

机译:过滤器元件的生产包括将膜层施加到基材上,蚀刻膜室以留下基材的残留层,在膜层中产生孔并去除残留层

摘要

Production of a filter element involves applying a membrane layer to a substrate, etching a membrane chamber on the side of the substrate lying opposite the membrane layer so that a residual layer of the substrate remains, producing pores in the membrane layer using a lithographic and etching process to create a perforated membrane, and removing the residual layer by etching to expose the membrane layer. Production of a filter element involves applying a membrane layer (1) to a substrate (2), etching a membrane chamber (3) on the side of the substrate lying opposite the membrane layer so that a residual layer (5) of the substrate remains, producing pores (6) in the membrane layer using a lithographic and etching process to create a perforated membrane, and removing the residual layer by etching to expose the membrane layer. The membrane layer is additionally treated during the first step or in a later step to raise its mechanical strength. An independent claim is also included for a filter element produced by the above process.
机译:过滤器元件的生产涉及将膜层施加到基底上,在基底的与膜层相对的一侧上蚀刻膜室,从而残留基底的残留层,使用光刻和蚀刻在膜层中产生孔。制备多孔膜的方法,并通过蚀刻去除残留层以暴露膜层。过滤元件的制造涉及将膜层(1)施加到衬底(2)上,在衬底的与膜层相对的一侧上蚀刻膜室(3),从而保留衬底的残留层(5)。使用光刻和蚀刻工艺在膜层中产生孔(6),以形成穿孔膜,然后通过蚀刻去除残留层以暴露膜层。在第一步或随后的步骤中对膜层进行额外处理以提高其机械强度。对于通过上述方法制造的过滤器元件也包括独立权利要求。

著录项

  • 公开/公告号DE10353894A1

    专利类型

  • 公开/公告日2005-02-17

    原文格式PDF

  • 申请/专利权人 NFT NANOFILTERTECHNIK GMBH;

    申请/专利号DE2003153894

  • 发明设计人 HOFMANN WILFRIED;

    申请日2003-11-18

  • 分类号B01D69/00;B01D71/02;

  • 国家 DE

  • 入库时间 2022-08-21 22:01:06

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