首页> 外国专利> Adding very small amounts of liquid to gas stream for analysis comprises using dosing system to wet surface with liquid and passing gas stream over surface to evaporate it

Adding very small amounts of liquid to gas stream for analysis comprises using dosing system to wet surface with liquid and passing gas stream over surface to evaporate it

机译:向气流中添加极少量的液体以进行分析,包括使用定量给料系统用液体润湿表面并使气流通过表面以使其蒸发

摘要

Adding very small amounts of liquid to a gas stream comprises using a dosing system to wet a surface with the liquid. The gas stream is then passed over the surface and evaporates it. An independent claim is included for an apparatus for carrying out the above process, comprising a dosing unit (3) which adds the liquid to a rotating drum (4) mounted in a housing (1) between the unit and the gas stream.
机译:向气流中添加非常少量的液体包括使用定量给料系统用液体润湿表面。气流然后通过表面并蒸发。包括用于执行上述过程的设备的独立权利要求,其包括配量单元(3),该配量单元(3)将液体添加到安装在该单元和气流之间的壳体(1)中的旋转鼓(4)中。

著录项

  • 公开/公告号DE10354031A1

    专利类型

  • 公开/公告日2005-06-30

    原文格式PDF

  • 申请/专利权人 MICRO MECHATRONIC TECHNOLOGIES AG;

    申请/专利号DE2003154031

  • 发明设计人 HEMPELMANN WILLI;

    申请日2003-11-19

  • 分类号B01F3/04;B01F5/02;B01F13/00;

  • 国家 DE

  • 入库时间 2022-08-21 22:01:03

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